Micromirror Arrays as Programmable Mask

Development of micromirror arrays as programmable mask for mask writers is carried out at the Fraunhofer IPMS under contracts with Micronic Laser Systems AB, Sweden. In parallel to further process and device optimizations, the activities are focusing on low volume delivery of qualified products. Those delivery devices comprise one million tilting micro mirrors (16 µm x 16 µm each) and are operated at a frame rate of 2 kHz. The devices are used in Micronics' commercially available Sigma-series mask writer systems.

In parallel to the product delivery, further development activities in the field of micro mirror technology and devices were carried out, aiming at future applications with even higher device specifications. As an example, different wafer bonding techniques were tested in order to use monocrystalline silicon as actuator material. The mechanical properties are superior to those of the currently used aluminum alloys. Furthermore, first demonstrator devices with monocrystalline silicon have shown very promising mirror planarities. One of the major challenges will be the tuning and transfer of bonding processes so that the technology becomes robust and reproducible on a level necessary for production of qualified devices. The large chip dimensions (current chip generation: 15 mm x 38 mm) have to be kept in mind.

Contact:

Moritz Fleischer
Fraunhofer Institute for Photonic Microsystems IPMS
phone: +49 (0) 351 / 8823-249
moritz.fleischer(at)ipms.fraunhofer(dot)de
www.ipms.fraunhofer.de